AppSec Your Developers Will
Not Despise
Actually Like
The integration between Endor Labs and GitHub Advanced Security creates a best-in-class application security platform that's designed for developer productivity. This is application security without the productivity tax.”
From open source security, to hardening repositories and prioritizing risks in 1st party code, create an AppSec workflow that keeps developers productive and keeps maintenance at a minimum.
Select Better Open Source Software
Select better open source dependencies with 150+ checks and scoring based on security, legal, popularity, activity, and quality. Defend against OWASP OSS Top 10 Risks such as typosquatting, malicious and abandoned dependencies.
Prioritize Open Source Vulnerabilities (SCA)
Cut over 90% of vulnerability noise with function-level reachability analysis across both direct and transitive dependencies. Codify highly customizable policies to provide developers feedback in PR comments, break builds in CI, or simplify notify them via Jira tickets.
Secure Repositories and CI/CD Pipelines
Gain visibility into security tool coverage across your CI/CD pipelines and continuously monitor the security posture of source code repositories. Detect repo and GitHub Actions misconfigurations, best practices, and risks with over 50 out-of-the-box policies, including coverage for CIS best practices for GitHub.
Trust What You Ship with Artifact Signing
Ensure the authenticity of software artifacts with a single GitHub action. Artifact signing is a hassle-free alternative to Sigstore that confirms code provenance and lack of tampering. Cryptographic artifact signatures are a powerful tool to enable strong admission control and traceability to support effective security, quality, and compliance programs.
Ensure compliance across the SDLC
Detect legal and licensing risk, and centrally create, manage, and analyze SBOM & VEX. Prioritize applicable vulnerabilities for PCI-DSS and FedRamp and accelerate compliance with CIS, NIST, SSDF, SLSA, EO 14028, and more.
